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Advanced Fringe Patterns Denoising and Processing via Ensemble Deep Learning Model
981
Vibekananda Dutta, Michał Jóźwik, Kohei Nimura (Warsaw University of Technology), Piotr Sosinowski, Adriana Mazurek (Central Office of Measures)
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Assessing the impact of lighting during Focus Variation scanning on the quality of mapping surfaces produced within the MEX process based on the FFF technology
479
Jolanta Królczyk, Piotr Niesłony, Marta Bogdan-Chudy, Grzegorz Królczyk (Opole University of Technology), Grzegorz Budzik, Łukasz Przeszłowski (Rzeszow University of Technology), Patryk Mietliński, Bartosz Gapiński, Michał Wieczorowski, Tomasz Bartkowiak (Poznan University of Technology), Anna Trych-Wildner, Natalia Wojciechowska (Central Office of Measures)
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Challenges in metrology of bio-mimicking microphantoms for quantitative phase imagining: perspective
745
Michał Ziemczonok (Warsaw University of Technology), Dariusz Czułek (Central Office of Measures), Małgorzata Kujawińska (Warsaw University of Technology)
About the journal
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Advanced Fringe Patterns Denoising and Processing via Ensemble Deep Learning Model
-
Challenges in metrology of bio-mimicking microphantoms for quantitative phase imagining: perspective
-
Assessing the impact of lighting during Focus Variation scanning on the quality of mapping surfaces produced within the MEX process based on the FFF technology